The dependences of source resistance,
Rs, transconductance,
gm, gate capacitance,
Cgs,
Cgd, and cutoff frequency,
fT, of InP-based HEMTs on an InAlAs barrier layer thickness,
d, were investigated. We divided
Rs into 4 elements and analyzed the effect of thinning a barrier layer. The resistance originated from the large band discontinuity between InAlAs and InGaAs decreased by thinning a barrier layer, while the resistance in the gate-recessed region increased. As a result, InP-based HEMT with
d=10 nm showed lowest
Rs. On the other hand,
gm increased monotonically with
d, due to the reduction of the gate to channel distance, and
gmint reached to 2.6 S/mm at
d=5 nm. We also estimated
fT by using small-signal measurements.
fT increased with the reduction of
d, which results in the improvement in noise characteristics.
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