電気学会論文誌A(基礎・材料・共通部門誌)
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
特集論文
エーテルを原料に用いた親水性アモルファス炭素膜の堆積と堆積反応の赤外分光解析
篠原 正典冨永 泰佑下村 勇登猪原 武士柳生 義人大島 多美子川崎 仁晴
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2018 年 138 巻 11 号 p. 538-543

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A hydrophilic amorphous carbon film was deposited with plasma enhanced chemical vapor deposition (PECVD) using diisopropylether ((i-C3H7)2O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp3-hydrocarbon components, which is the same as the isopropy group in the source molecule. On the other hand, C=O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C-O-C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.

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