抄録
The precise 3D microstructures with a high aspect ratio are needed in many advance applications. This paper describes recent advantages and prospects of precise 3D microfabrication with a high aspect ratio. Especially LIGA process using synchrotron radiation is applied to pattern regist layers with typical thickness from several μm to 2000μm. Here next technical targets of LIGA process are described. And a variety of ultra Precise 3D microstructures process brought LIGA process allows a new diffraction grating for obtaining high-resolution phase data. We developed the fabrication technique composed MEMS process and LIGA process. The line width and the aspect ratio of this grating are 4μm and above 7, respectively. We evaluated the diffraction grating in SPring 8.
