ナノインプリントを用いた金属埋め込みポリマー微細周期構造体の作製

抄録

Many nano-application research have been conducted with development of nanoimprint technologies. In particular, metal or metal-polymer hybrid nanostructures have great potentials as nano-devices such as localized surface plasmon resonance (LSPR) devices, wire grid polarizer (WGP) and organic electronics. The metal embedded polymer periodic nanostructures are also expected as a control substrate to array nanoparticles at three dimensional photonic crystal (3DPC). In this study, we propose and demonstrate new fabrication process based on a combination technique of vacuum evaporation and nanoimprint as a fabrication method for the metal embedded nanostructures. As the result, the PMMA nanodot array (approximate 100 nm in diameter with 300 nm pitch) with gold round films embedded at their bottoms were fabricated successfully using this method. Application to 3DPC and other nanodevices of these nanostructures and fabrication process are described.