二重凹角構造ピラーアレイを応用した超撥水性表面の低コスト量産プロセスの開発

抄録

A new fabrication process of a superrepellent surface using a doubly reentrant structure pillar array was developed. The proposed process applying a soft-lithography is simple, low-cost, and mass-productive process compared to the conventional process. It enables to fabricate a doubly reentrant structure pillar array on glass, silicon, and PDMS substrates.