NUMERICAL SIMULATION ON A NOVEL MIXED DUAL BEAM LASER CRYSTALLIZATION METHOD

抄録

We propose a novel mixed dual beam laser crystallization method, where two different pulse lasers with different wavelength successively irradiate on Si film. Thermodynamic computer model of laser annealing is used to analyze the solidification characteristics of Si film annealed by the novel method. The simulation results demonstrate that the novel method is a promising one to reduce solidification velocity effectively.