Degradation of organic silane monolayers on silicon wafer during XPS measurement

抄録

  The degradation of organic materials was often observed during XPS measurement. We have evaluated the degradation of silicon wafers modified with 3,3,3-trifluoropropyltrimethoxysilane (F3PTMS-Si), 3-chloropropyltriethoxysilane (CPTES-Si), 3-bromopropyltrimethoxysilane (BPTMS-Si) and 3-iodopropyltrimethoxysilane (IPTMS-Si), and gold substrate modified with 1H,1H,2H,2H-perfluorodecanthiol (PFDT-Au) as reference material in order to investigate influence of C-F, C-Cl, C-Br and C-I bonds in the organic silane monolayers. As a result, the order of damaging factor, β, was IPTMS-Si > BPTMS-Si > CPTES-Si > F3PTMS-Si. It was found that the value of β was related to the chemical bond energy of C-X(X=F, Cl, Br, I).