504 Commercial Femtosecond Micromachining System for Sub-micron/sub-millimeter Scale Patterning

抄録

Commercial femtosecond micromachining system (FMS) has been developed that capable to process material in sub-micron (<200nm), micron and millimeter scale. The system structure and capabilities are presented. Basic functions of the system performance are controlled by sophisticated software. The files prepared with standard software can be acceptable for pattern fabrication. The results obtained by FMS are presented and discussed : bits in the range of 100-200 nm sizes, 6 TB/cm^3 density optical storage matrix, waveguides fabrication inside transparent materials, high aspect ratio (1 : 125) patterning of dielectric materials with Bessel beam, micro-drilling, micro-cutting and micro-pattern formation in the range of tens of millimeters.