抄録
This study aimed to fabricate nanoscale structures on monocrystalline silicon substrates using nanoscratching. In this paper, nano/micro-scale line-and-space patterns were generated on a silicon substrate using an atomic force microscope equipped with a sharp probe made of monocrystalline diamond. Subsequent chemical etching was also conducted on the fabricated line-and-space patterns. As a result, it was confirmed that the groove was deepened several times but little increased in its width. A nanoimprint experiment was also performed to duplicate the line-and-space patterns by use of the fabricated line-and-space mold and polycarbonate resin film.
