Effects of Sputter Order and Oxide Layer on Amorphous Formation of Zr-Ni Thin Film System

Abstract

Effects of the sputtering order and the presence of an oxide layer on an amorphous metal layer formation of zirconium-nickel bilayer thin films annealed at 623 K (350°C) have been investigated. Nickel species are found to diffuse preferentially from the nickel layer into the zirconium layer in Zr/Ni bilayer thin film. From this diffusion, the amorphous phase and voids are formed. However, by the change of the sputtering order and with the formation of a Zr oxide layer, the amorphous and voids are not formed. This indicates that nickel species migrate into the amorphous layer by means of vacancies. Vacancies are supplied from the zirconium-free surface.