Preparation of BaTi2O5 films on (100), (110) and (111) MgO substrates by laser CVD

抄録

BaTi2O5 (BT2) films were prepared on (100), (110) and (111) MgO substrates by laser CVD using Ba(DPM)2 and Ti(OiPr)2(DPM)2 as precursors. The orientation of BT2 films on (100), (110) and (111) MgO substrates was (020), (112) and (-113), respectively. The growth modes of BT2 films prepared on different MgO substrates were investigated.