Nano-scale Deformation of Resist Film Surface by Humidifying and Drying Processes

Abstract

Nano-scale deformation of resist film surface is analyzed by using atomic force microscope (AFM) in a humidity controlled chamber. It is clarified that the condensation size of polymer aggregates of resist material are slightly changed due to humidity change. As one major factor, Laplace force acting among polymer aggregate due to surface adsorbed water is discussed. The deformation model of condensed polymer aggregates is proposed.