An imaging system based on hydrophobic organic layer formation on ferrous oxide (Fe
2O
3) semiconductor electrodes was studied.
Fe
2O
3 thin film semiconductor electrodes were prepared by two methods; i) thermal oxidizing treatment of pure iron plates, ii) spray pyrolysis of FeCl
3 on conducting plates. Both of the ferrous oxide samples prepared could be used as a photoanode in the photoelectrochemical imaging system.
After photoelectolysis of the Fe
2O
3 electrodes in electrolytic solutions containing an aromatic compound (o-toluidine), a hydrophobic organic layer was formed on the surface. This reaction brought about an image which was applicable to planographic printing system. Change in wettability of the electrode surface was observed at the wavelength shorter than 550 nm, which nearly corresponded to the band gap energy of Fe
2O
3. This spectral property of the photorecepter satisfies the use of the imaging system in a visible wavelength region.
Differences in photoelectrochemical or imaging characteristics between the two types of Fe
2O
3 electrodes were also discussed in the present report.
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