The negative uniaxial magnetocrystalline anisotropy (
Ku) was evaluated for various compositions of Co
100−xIr
x thin films with respect to the atomic layer stacking structure. Pure Co film fabricated at a substrate temperature (
Tsub) of 600 ℃ was found to have a positive
Ku of 6.1×10
6 erg/cm
3. With increasing
x, the sign of
Ku changed from positive to negative, and the negative
Ku took a maximum value of −9.6×10
6 erg/cm
3 at around
x = 20 at. % for films fabricated at
Tsub = 600 ℃. Adding more Ir decreased the absolute value of the negative
Ku which became 0 over
x = 50 at. %. X−ray diffraction analysis and scanning transmission electron microscopy revealed that the atomic layer stacking structure of the Co
100−xIr
x films changed from −A−B−A−B− (hcp) to −A−B−C−A−B−C− (fcc) stacking with increasing Ir content. Moreover, Co
80Ir
20 grains were revealed to consist of 2 kinds of randomly located composition−modulated atomic layers, nearly pure−Co and pure−Ir layers, while Co and Co
50Ir
50 had disordered structures. In this paper, a new perspective on the atomic layered structure with superlattice diffraction, which is different from the conventional “ordered structure”, is discussed.
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