Since the dry film formed from positive photoresist is brittle and lacking in flexibility, there is a problem in making it a roll product. In order to solve this problem, cresol novolac resin having flexibility and high precision lithography performance is introduced. When the molecular structure giving flexibility to cresol novolak resin is imaged, i) introduction of aldehyde component with free linkage chain, ii) introduction of aldehyde component with side chain structure, iii) introduction of bulky aldehyde component, etc. can be considered. Specific examples include i) the introduction of dialdehydes with alkyl chains such as glyoxal (alkyl chain length (x) = 0), succinaldehyde (x = 2), glutaraldehyde (x = 3), and/or adipoaldehyde (x = 4), ii) the introduction of butanal, etc., and iii) the introduction of 5-hydroxymethylfurfural (HMF) derived from monosaccharides. Among them, it was found that HMF with rigid heterocyclic component and bulky molecular structure resulted in extremely higher flexibility than the others.
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