Since the dry film formed from positive photoresist is weak in film quality and lack in flexibility, there is a problem in making it a roll product. Therefore, focusing on the aldehyde component of the cresol-novolac resin, we found that introducing the alkyl chain of the freely linked chain using glutaraldehyde is good for adding flexibility. In this paper, the focus is shifted from aldehydes to phenolic components in order to achieve greater flexibility than that obtained by previous our work. Specifically, bisphenol A (BisA) and bisphenol C (BisC), which have bulky isopropylidene groups on the molecular chain skeleton, bisphenol P (BisP) and bisphenol M (BisM), which have two isopropylidene groups, bisphenol B (BisB), which has a methylpropylidene group having an alkyl side chain elongation effect in addition to bulkiness, and bisphenol E (BisE), which has an ethylidene group with slightly reduced bulkiness are mentioned as the phenolic components. The flexibility of the bisphenol-type novolac resin exceeded that of the cresol-type novolac resin. Especially the novolac resin composed of BisB or BisC exhibited high flexibility and high precision lithographic performance. It was concluded that these molecular structures require (i) introduction of a bulky isopropylidene unit, etc. into the molecular framework, (ii) expansion of the phenolic component interval by using glutaraldehyde, etc., which has a freely linked chain as a crosslinker, (iii) having a somewhat high molecular weight, and (iv) having a molecular structure that is easy to form hydrogen bonds.
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