抄録
A computer simulation model is presented for ion induced deposition and sputtering in two-dimensional topographic surfaces. The model combines dynamic Monte Carlo simulation of the collision cascade with surface topography simulation, which treats compositional changes self-consistently with the evolution of the surface. An application is presented: erosion and deposition of a ripple surface of carbon irradiated by tungsten ions. Due to the deposition of implanted particles and the redeposition of sputtered particles, the surface topography drastically changes. Sharp wedges are formed on the ripple surface. With increasing ion fluence and energy, the surface is dominated by an oscillatory feature, where the initial ripple structure disappears. Since the redeposition is more for a steep slope than for a gentle slope, the redeposition produces both a peaked region and a shadowed region on the surface against the next redeposition. The surface topography changes strongly influence the W concentration in a W-C mixed layer formed on the C bulk. [DOI: 10.1380/ejssnt.2006.32]
