Photoelectrochemical Study of the Inhibiting Action of Benzotriazole and Carboxybenzotriazole Alkyl Esters on Copper Corrosion

抄録

The photoelectrochemical behavior of copper electrode in sodium borate solutions (pH 9.2) containing benzotriazole (BTA), carboxybenzotriazole methyl ester (CBTME) and carboxybenzotriazole butyl ester (CBTBE) was studied by using photoelectrochemical techniques. The photoresponse of the electrode in solutions containing the above compounds exhibited an n-type semiconductor action during anodic polarization. Based on the results of coupon tests, the inhibiting action of the additives was in the order of BTA > CBTME > CBTBE. The combination of BTA and CBTME had a synergistic effect, and the optimum ratio was found to be 2 mg/dm³ BTA and 3 mg/dm³ CBTME. The results obtained from the photoelectrochemical technique agreed well with those obtained from the coupon tests and AC impedance spectroscopy.