Improved Electrodeposited Multilayer Structure by Coulomb Controller

抄録

The effectiveness of a coulomb controller in improving the uniformity of multilayer structures was investigated by electrodepositing Co-Cu/Cu multilayers by a potentiostatic single bath method with a target layer thickness of 5 nm. Current analysis and cross-sectional field-emission scanning electron microscopy observations revealed that the layer thickness fluctuated when it was controlled by the deposition time. However, the thickness variation obeyed Faraday's law. Another sample was electrodeposited using a coulomb controller, which controls the layer thickness by the quantity of electricity. The layer thickness was constant in this sample.