Electrochemistry
Online ISSN : 2186-2451
Print ISSN : 1344-3542
ISSN-L : 1344-3542
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Chiral Nanoporous Structures Fabricated via Plasmon-Induced Dealloying of Au-Ag Alloy Thin Films
Hiroyasu NISHI Taro TOJOTetsu TATSUMA
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2024 年 92 巻 5 号 p. 057003

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Chiral plasmonic nanostructures are of significant interest because of their strong chirality compared to typical chiral molecules and their potential for various applications such as enantioselective sensors and metamaterials. Although chemical or photochemical fabrication methods for chiral nanostructures have attracted attention because of their cost-effectiveness and large-area applicability, most of the chemically synthesized chiral nanostructures are two-dimensional ensembles or arrays of individual chiral nanoparticles. In the present study, more three-dimensional, densely interconnected chiral plasmonic nanoporous structures are fabricated via plasmon-induced dealloying of Au-Ag alloy under circularly polarized light (CPL). CPL is used as a sole chiral source and irradiated to a chemically treated Au-Ag alloy film showing absorption due to localized surface plasmon resonance (LSPR). The resulting nanoporous structures exhibit chiroptical responses depending on the handedness CPL illuminated. The mechanism of chirality introduction is discussed on the basis of an electromagnetic simulation.

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© The Author(s) 2024. Published by ECSJ.

This is an open access article distributed under the terms of the Creative Commons Attribution-NonCommercial-ShareAlike 4.0 License (CC BY-NC-SA, http://creativecommons.org/licenses/by-nc-sa/4.0/), which permits non-commercial reuse, distribution, and reproduction in any medium by share-alike, provided the original work is properly cited. For permission for commercial reuse, please email to the corresponding author. [DOI: 10.5796/electrochemistry.24-00027].
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