抄録
Photolyses of phenol-alkylene oxide adducts as model compounds of nonionic surfactants in aqueous solution by sodium hypochlorite was studied. Alkylene oxides such as ethylene oxide, propylene oxide, 1, 2-butylene oxide, and styrene oxide were employed. In the presence of a large excess of hypochlorite, these compounds were completely photolyzed to give carbon dioxide. In the photolysis of an equimolar mixture of substrate and hypochlorite, the probable intermediates were analyzed by means of GC-MS. Irradiation of styrene oxide adduct with hypochlorite gave mainly phenol, arylalkylaldehyde, benzoic acid and monochlorobenzoic acid. In the cases of other alkylene oxide adducts, phenol, anisole, chlorophenol and small amounts of chlorinated compounds were detected.
