抄録
Deposition of Diamond-Like Carbon (DLC) films at atmospheric pressure is one of promising techniques to achieve in-process coatings regardless work sizes. This research aims at synthesis of DLC films under atmospheric pressure by nanopulse Chemical Vapor Deposition (CVD) method using unique power source system that consists of a static induction (SI) thyristor and an Inductive Energy Storage (IES). In this report, we realized synthesis of DLC films in open air (101 kPa). Deposition rate was as high as 0.4μm/min, and the hardness of the film was 20.6 GPa. From Raman spectroscopic analysis, quality of film significantly depends on input power and deposition time.
