表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
論文
自己組織化高分子多孔質構造を利用して作製したシリコン微細構造の濡れ性パターニング
平井 悠司藪 浩松尾 保孝居城 邦治下村 政嗣
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2011 年 32 巻 7 号 p. 416-421

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We demonstrate here a creation of superhydrophobic and superhydrophilic patterned surface by using reactive ion etching (RIE) of silicon with a self-organized porous polymer structures and UV-O3 treatments through the photo-mask. Honeycomb-patterned films of polystyrene and amphiphilic polymer were prepared by casting of their chloroform solution. After UV-O3 treatment, honeycomb-patterned films were fixed on silicon substrates up side down with Poly (vinyl alcohol) solution. After peeling of the bottom layer of the honeycomb-patterned films, porous polymer masks were formed on the silicon substrate. After RIE, the silicon nanospike-array structure was obtained. Water contact angles on the silicon nanospike-array structures were c. a. 165 degree. From the results of X-ray photoelectron spectrum of the silicon nanospike-structures, fluorine was detected. The result suggests that superhydrophobicity was originated by absorbed fluorocarbons on the surface of the silicon nanospike-array structures and their surface structures. After UV-O3 treatment with photo-masks, fluorine was partially removed at irradiation area, and the area shows superhydrophilicity. These results suggest that we can easily design superhydrophobic and superhydrophilic patterned surfaces by UV-O3 treatment through photo-masks.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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