2011 年 32 巻 7 号 p. 416-421
We demonstrate here a creation of superhydrophobic and superhydrophilic patterned surface by using reactive ion etching (RIE) of silicon with a self-organized porous polymer structures and UV-O3 treatments through the photo-mask. Honeycomb-patterned films of polystyrene and amphiphilic polymer were prepared by casting of their chloroform solution. After UV-O3 treatment, honeycomb-patterned films were fixed on silicon substrates up side down with Poly (vinyl alcohol) solution. After peeling of the bottom layer of the honeycomb-patterned films, porous polymer masks were formed on the silicon substrate. After RIE, the silicon nanospike-array structure was obtained. Water contact angles on the silicon nanospike-array structures were c. a. 165 degree. From the results of X-ray photoelectron spectrum of the silicon nanospike-structures, fluorine was detected. The result suggests that superhydrophobicity was originated by absorbed fluorocarbons on the surface of the silicon nanospike-array structures and their surface structures. After UV-O3 treatment with photo-masks, fluorine was partially removed at irradiation area, and the area shows superhydrophilicity. These results suggest that we can easily design superhydrophobic and superhydrophilic patterned surfaces by UV-O3 treatment through photo-masks.