Electrochemistry
Online ISSN : 2186-2451
Print ISSN : 1344-3542
ISSN-L : 1344-3542
Volume 67 , Issue 9
Showing 1-9 articles out of 9 articles from the selected issue
Vision
Headline
  • Tetsuya OSAKA, Toshiyuki MOMMA, Tokihiko YOKOSHIMA
    1999 Volume 67 Issue 9 Pages 894-899
    Published: September 05, 1999
    Released: November 15, 2019
    JOURNALS OPEN ACCESS

    Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (Bs) and low coercivity. Magnetic properties except for Bs and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high Bs CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.

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Communication
Technical Paper
  • Shin’ichi MAGAINO, Masayasu SOGA, Kazuharu SOBUE, Akihiro KAWAGUCHI, H ...
    1999 Volume 67 Issue 9 Pages 903-911
    Published: September 05, 1999
    Released: November 15, 2019
    JOURNALS OPEN ACCESS

    Deposition and dissolution mechanism of lithium on the aluminum substrate has been investigated by electrochemical impedance spectroscopy (EIS) and x-ray photoelectron spectroscopy (XPS). Every impedance diagram obtained during deposition and dissolution periods consists of two loops. The diameter of the high-frequency loop is almost constant regardless of the amount of deposition or dissolution, while the magnitude of the low-frequency loop decreases with increasing deposition period, and increases with increasing dissolution period. XPS results showed a surface film, which consists of an outer LiF layer and an inner LiOH-Li2O layer, forms on the Li-Al alloy. Thickness of the LiOH-Li2O layer increases with dissolution period. The mathematical analysis of a model mechanism suggests that the high-frequency loop of the impedance diagram may correspond to both the charge-transfer resistance and the resistance of the LiF layer. The low-frequency loop may comprise the diffusion process of Li+ in the LiOH-Li2O layer, the coverage relaxation of the adsorbed species Liads and Li+ ads, and the alloying process of Li-Al.

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Special Articles
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