The anodic behaviour of copper has been studied in alkaline solution using a rotating disk electrode and an ellipsometer. Anodic peak currents corresponding to Cu
2O and Cu(OH)
2-CUO formation during potential sweep were measured at various rotating speeds of Cu electrode. The peak current values showed a linear relationship to square-root of the rotating speed, indicating that the formation of Cu
2O and Cu(OH)
2-CuO films is controlled by the diffusion process of some species in the solution. A conventional method to prepare the copper substrate was proposed, and the refractive index of copper substrate was estimated to be 1.11-2.42
i, which is in good agreement with that reported by other investigators. The refractive index of Cu
2O film, formed anodically, was 1.90-0.30
i. This film appears to have a loose structure compared with crystalline cuprous oxide. The surface of copper substrate was roughened by anodic oxidation-cathodic reduction treatments.
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