The growth rate of hydride layer on the surface of titanium, which was cathodically polarized in sulfuric acid, was measured by application of the so-called etching method. The principle and the procedure of this method were rather simple; the specimen covered with a hydride layer was dissolved layer by layer by the short-time dipping in the dilute mixed solution of nitric and hydrofluoric acids, and the hydrogen-titanium ratio of the dissolved portions were determined from the weight loss of specimen and the volume of evolved hydrogen gas. From the data of a series of repeated dissolutions with a single specimen, the hydrogen concentration profile was depicted, and also the amount of hydrogen uptake and the thickness of layer were determined. The profile took a S-shaped curve and consisted of two steep and one flat branches. The results of the X-ray diffraction indicated that both of the outer steep and the flat branches corresponded to a single f. c. c. titanium hydride phase and the inner steep branch to the mixed phases of the f. c. c. and the hexagonal α-titanium. The increase of the cathodic current density and the raising of temperature both stimulated the hydrogen absorption. The rate law changed in accordance with various experimental parameters; for example, it was linear at lower current density and higher temperature, while parabolic at higher current density and lower temperature. Effects of the solution inpurities and the crystalline grain size were also investigated.
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