Journal of The Japan Institute of Electronics Packaging
Online ISSN : 1884-121X
Print ISSN : 1343-9677
ISSN-L : 1343-9677
Fluorinated Polyimide Waveguide Film Fabricated by Replication Process with a Silicon-Oxide Antisticking Layer and Its Applications
Tsuyoshi SHIODA
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2002 Volume 5 Issue 6 Pages 574-581

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Abstract
A new replication process with a silicon-oxide antisticking layer was demonstrated using a fluorinated polyimide. A thin silicon-oxide coating was introduced on the top of the mold as the antisticking layer, which could significantly improve the separation between the mold and the fluorinated polyimide film without degrading the optical property. A single- and a multimode waveguide film were fabricated using a cladding film with grooves formed by our replication process. The waveguide exhibited very low optical propagation losses of 0.30dB/cm and 0.36dB/cm at the wavelengths of 1310nm and 850nm, respectively. In addition, a 2-layer polyimide waveguide and an electrical-optical printed circuit board (EOPCB) were fabricated easily by hot-pressing method, using the fluorinated polyimide waveguide and a fluorinated poly (amic acid) film as an adhesive layer.
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