Study was made to determine the photomineralization mechanisms of two nonionic surfactants,
N- (2-hydroxyethyl) dodecanoyl amide and
N,
N-bis (2-hydroxyethyl) dodecanoyl amide based on temporal changes in surface tension, ζ-potential, evolution of CO
2 gas, formation of NH
4+ and NO
3- ions, and formation of carboxylic acids. The adsorption of surfactants on the TiO2 surface was also examined by dynamic light-scattering. The generation of NH
4+ ions exceeded that of NO
3- ions in the photodegradation of either surfactant. Positions on the surfactants attacked by
·OH radicals were determined by molecular orbital calculations of frontier electron density. Negatively charged positions in the surfactants adsorb on the positive TiO
2 surface and could consequently be easily attacked by
·OH radicals. A photooxidation mechanism of
N- (2-hydroxyethyl) dodecanoyl amide and
N,
N-bis (2-hydroxyethyl) dodecanoyl amide is proposed on the base of the present experimental data and comparison with calculation results.
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