TANSO
Online ISSN : 1884-5495
Print ISSN : 0371-5345
ISSN-L : 0371-5345
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Volume 1969, Issue 59
Displaying 1-4 of 4 articles from this issue
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  • Automatic Measurement of The Hall Voltage and Magnetoresistance in Carbon Materials as Functions of Magnetic Field
    Akio Ono, Yoshihiro Hishilyama
    1969 Volume 1969 Issue 59 Pages 272-275
    Published: December 30, 1969
    Released on J-STAGE: June 28, 2010
    DOIhttps://doi.org/10.7209/tanso.1969.272
    JOURNAL FREE ACCESS
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    An electronic device for the use of the continuous and automatic measurement of the Hall voltage and magnetoresistance as functions of the magnetic field has been assembled, with several commercial instruments, and has yielded a great success for carbon materials. In practice, one has to take best care of the perfect shield of various leads as well as the one point earthing. Especially, when the specimen is of high resistance and of low magnetoresistance, every effort should be made for suppressing the current fluctuation as small as possible.
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  • Effect of Geometrical Factors on the Shape of Diffraction Profile for Natural Graphite and Petroleum Coke
    Experimental Results on the Effect of Sample Thickness, Slit Width and Formation of Internal Preferred Orientation Layer
    Kazuo Kobayashi
    1969 Volume 1969 Issue 59 Pages 276-285
    Published: December 30, 1969
    Released on J-STAGE: June 28, 2010
    DOIhttps://doi.org/10.7209/tanso.1969.276
    JOURNAL FREE ACCESS
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    Half maximum breadth (Bo) of a diffraction profile of carbon increased with the increase of sample thickness. When sample thickness was less than 0.2mm, Bo value came closely to the value obtained by the reflection only from the surface. When silicon powder was used as an internal standard, Bo value of (002) diffraction line was almost constant regardless of sample thickness. But Bo value of (004) and (110) lines showed still some broadness due to penetration of X-ray beam into sample, even if silicon powder was used as an internal standard. Therefore, it is concluded that it is preferable to use sample thickness less than 0.2mm and to use slit width as small as possible in order to reduce low absorption effect of the sample.
    Shape of (00l) diffraction profiles was also affected by the reflection from an internal well-oriented layer in the sample which might be produced during mounting process. If the internal well-oriented layer is made at a distance from the rotation axis, the reflection from the layer appears at displaced position, and the reflection overlaps the profile which is reflected from surface layer.
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  • [title in Japanese]
    [in Japanese]
    1969 Volume 1969 Issue 59 Pages 286-290
    Published: December 30, 1969
    Released on J-STAGE: June 28, 2010
    DOIhttps://doi.org/10.7209/tanso.1969.286
    JOURNAL FREE ACCESS
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  • [title in Japanese]
    [in Japanese]
    1969 Volume 1969 Issue 59 Pages 291-297
    Published: December 30, 1969
    Released on J-STAGE: June 28, 2010
    DOIhttps://doi.org/10.7209/tanso.1969.291
    JOURNAL FREE ACCESS
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