Journal of The Japan Institute of Electronics Packaging
Online ISSN : 1884-121X
Print ISSN : 1343-9677
ISSN-L : 1343-9677
Technical Paper
Influence of Crystalline Texture on Etching Rate of Copper by Use of Sulfuric Acid/Hydrogen Peroxide Etching Solution
Kenji KubotaKatsutoshi MatsumotoSachio Yoshihara
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2013 Volume 16 Issue 2 Pages 119-126

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Abstract
The influence of the crystalline texture on the etching rate of copper was studied in a sulfuric acid/hydrogen peroxide etching solution using a scanning probe microscope (SPM), electron back scatter diffraction patterns (EBSD), and polarization techniques. The results clearly showed that the crystal faces oriented around the {101} and {111} faces etched at a slower rate than those oriented around the {001} face. The {001} oriented polycrystalline copper showed a relatively noble corrosion potential and depolarization of the cathodic partial reaction. It was suggested that the etching rate of polycrystalline copper is controlled by the mean value of the reduction rate of the hydrogen peroxide on each of the grain surfaces. The {001} face has the highest reduction rate of hydrogen peroxide on the grain. The addition of 1-propanol to the etching solution could reduce the difference for the etching rate of each crystal orientation.
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© 2013 The Japan Institute of Electronics Packaging
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