In order to investigate the changes in required psychological characteristics in pilots, we reviewed the studies on the pilots’ opinions, which were conducted in 1968, 1998, and 2009. In all these studies, the response rates for “sense of responsibility” and “calmness,” belonging to the category of personality and intention, were found to rank high. The response rates for “flexibility” seemed to rank higher in the studies of 1998 and 2009 than in the study of 1968. In the studies of 1998 and 2009, the response rates for “judgment,” “attention,” and “communication ability,” belonging to the category of ability, were ranked high. These results suggest that the pilots’ opinions about required psychological characteristics in pilots seemed to have hardly changed compared with about ten years ago, but they seemed to have slightly changed compared with about forty years ago.

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There were occupational health problems concern about exposure of flight line personnel to jet fuel JP-4 including volatile toxic compounds such as benzene and n-hexane. We measured for 19 flight line personnel exposures to 48 target volatile organic compounds (VOCs) during JP-4 fueled F-15 aircraft maintenance on a day shift. Active personal air sampler with activated chacoal was used for sampling VOCs. There were 6 straight-chain alkanes with a chain length of C6 to C11 and 5 aromatic hydrocarbons including benzene, toluene, ethylbenzene and xylenes. The highest exposure level was observed in the personnel who reported exposure to the aircraft exhaust plume. The estimated flight line exposure levels (n-hexane; 408ppb, n-heptane; 143ppb, toluene; 48ppb and benzene; 58ppb) calculated from the day shift exposure levels of this highest sample date did not exceed the values of exposure limits recommended by the National Institute for Occupational Safety and Health and Japan Society for Occupational Health. There was no significant correlation between exposure levels and flight line operations, such as working time, number of refueling and awareness of exposure.

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