Mo/Nb/
γ-TiAl functionally graded materials (FGMs) were prepared using a spark plasma sintering (SPS) method, and the MoSi
2/Mo/Nb/
γ-TiAl FGMs were then siliconized in molten salts. The MoSi
2/Mo/Nb/
γ-TiAl FGMs before and after oxidation at 1323 K in air were evaluated using optical microcopy, X-ray diffraction, scanning electron microscopy, and energy-dispersive X-ray spectroscopy. The Mo/Nb/
γ-TiAl FGMs were obtained by joining at 1373 K for 5 min using SPS. The Nb foil was firmly joined to the
γ-TiAl surface and the Mo foil was firmly joined to the Nb foil. The Δ
αNb-MoΔ
T and Δ
αγ-TiAl-MoΔ
T values were consistent with the criterion for stable FGMs without interlayer cracking of Δ
αΔ
T less than 4.3×10
-3, where Δ
αNb-Mo and Δ
αγ-TiAl-Mo are the differences between the coefficients of thermal expansions of Nb and Mo, and between those of
γ-TiAl and Nb, and Δ
T is the difference between the SPS temperature and room temperature. The Mo/Nb/
γ-TiAl FGMs were siliconized by dipping in a molten-salts mixture before heating in a mullite crucible at 1173 K for 40 h. The MoSi
2Mo/Nb/
γ-TiAl FGMs were dense and had neither cracks nor voids. The thickness of the MoSi
2 layer was approximately 50
μm. The thickness loss of the MoSi
2/Mo/Nb/
γ-TiAl FGMs was 11
μm after the 200 h exposure to air at 1323 K. The thickness loss of the MoSi
2/Mo/Nb/
γ-TiAl FGMs was approximately 20 % less than that of NbSi
2/Nb/
γ-TiAl FGMs.
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