As part of studies on plasma-wall interactions of fusion reactors, the effect of Ar ion sputtering of both the upstream side and the downstream side surfaces of a V coupon upon its H
2 permeability has been studied. The Hz permeability measuring apparatus has been modified to install another ion gun for the use in sputtering the downstream side speci-men surface. The H
2 permeation rates were measured at 673 K by changing the H
2 pressure and sputtering mode. The downstream side sputtering has been observed to enhance the H
2 permeability, though its degree was smaller than that due to the upstream side sputtering. The both side sputtering resulted in the largest H
2 permeability value ever obtained for V. The rate of H
2 permeation through V seemed to be determined by the surface processes including the downstream side rather than the bulk diffusion even after the both side sput-tering. Based on AES measurements, the enhancement of H
2 permeability caused by sputtering was attributed to the diminishing of the surface O impurity.
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