As new application of Al4SiC4, which was developed as the oxidation inhibitor of refractories, advanced self-healing agents for structural ceramics has been proposed. The required properties of Al4SiC4 for self-healing agent were investigated by means of analysis of the elementary processes of high-temperature oxidation and assessment of the oxidation rate under constant heating. The usefulness of Al4SiC4 for self-healing agent was estimated by comparing the obtained results with the references of SiC. 　As a result, Al4SiC4 exhibited enough high oxidation rate to occur self-healing at 300 ℃ lower than that of SiC. It was found that Al4SiC4 is a useful self-healing agent at lower temperatures compared to SiC.

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