Taikabutsu
Online ISSN : 2759-3835
Print ISSN : 0039-8993
Volume 67, Issue 8
Taikabutsu Vol.67 No.8 August 2015
Displaying 1-1 of 1 articles from this issue
  • Hideo ASAKURA, Yasujiro YAMADA, Kouhei KANSAI, Ichirou TOMATSU, Mamoru ...
    2015Volume 67Issue 8 Pages 376-387
    Published: August 01, 2015
    Released on J-STAGE: May 01, 2024
    JOURNAL FREE ACCESS
    X-ray fluorescence(XRF)analysis is a rapid and precise quantitative analytical method for the determination of major and trace elements in many industries and academics. XRF analytical values are relative due to the use of the calibration curves calculated from measuring the reference standard materials such as Japanese Refractory Reference Materials(JRRM)series with certified values determined by wet chemical analysis. The development of the XRF analytical method from relative to absolute analysis will help much to determine the absolute values of samples from the fields where reference standard samples have not been prepared, and thus can be applied widely in many industries. The implement of the absolute XRF analysis for silica refractories requires high purity reagents and/or reference standard solution for the binary basic calibration curve, and theoretical matrix orrection coefficients for the multi-components silica refractories analysis. The reproducibility and repeatability of this method for Al2O3 5 mass% sample were 0.009 and 0.006 mass% in Al2O3 and showed better values than those of ICP-AES recognized as an absolute method in JIS R 2212-2, which yielded 0.028 and 0.031 mass%, respectively. The XRF absolute analysis for JRRM 200 series, 201a and 205a does not show a bias but coincides with their certified values.
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