Co/pt multilayered films were prepared on heated glass slides by electron beam evaporation. It was found that perpendicular anisotropy
K⊥ increased with elevating substrate temperature
Ts. Interface anisotropy
Ks and volume anisotropy
Kv were evaluated from the dependence of
K⊥ on bilayer period λ In the range of
Ts from 30 to 130°C,
Ks increased with elevating
Ts while
Kv hardly depended on
Ts. On the other hand, at
Ts = 300°C,
Ks was almost zero but
Kv was positive and large, which made
K⊥ almost independent of λ. It was also found that substrate heating was quite effective to enhance coercive force
Hc⊥. Though
K⊥ was hardly dependent on Pt buffer layer thickness,
Hc⊥ increased with thickening Pt buffer layer. There was no correlation between low angle X-ray diffraction intensity
I1 and
Ks or between
I1 and
K⊥. Though the dispersion of (111) orientation, Δ
θ50, decreased with elevating
Ts, there was no clear correlation between Δ
θ50 and
K⊥ or between Δ
θ50 and
Hc⊥. The films deposited on room temperature substrates were annealed in vacuum. With elevating annealing temperature
Ta,
Ks decreased while
Kv slightly increased. Though Δ
θ50 was hardly changed by annealing,
I1 decreased with elevating
Ta.
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