Gd-Fe-Co and SiN
x were prepared by magnetron sputtering using Ar or Kr gas. The sample structure consisted of glass substrate/underlayer SiN
x/Gd-Fe-Co/protective layer SiN
x. When the SiN
x layers were prepared using Kr gas, the coercivity
Hc of Gd-Fe-Co increased. On the other hand, when the Gd-Fe-Co layer was prepared using Kr gas, the perpendicular magnetic anisotropy
Ku and
Hc of Gd-Fe-Co increased. The ratio of
MsHc to 2
Ku was also increased by Kr sputtering. This means that
Hc increased at a greater rate than
Ku. By etching the surface of the underlayer SiN
x prior to the deposition of the Gd-Fe-Co layer, it is possible to reduce
Hc without affecting
Ku. By combining the Kr gas sputtering and the etching,
Ku can be increased without increasing
Hc. A Gd-Fe-Co layer with a periodic structure of Gd and Fe-Co has larger
Ku and
Hc than alloys of Gd and Fe-Co. Etching the surface of the underlayer SiN
x is also effective for reducing the
Hc value of the periodic structure of Gd-Fe-Co.
View full abstract