Porous anodized processing film is used for the vacuum equipment's aluminum alloy such as in the chemical vapor deposition system and a etching system as a corrosion resistance surface treatment. This sealing treatment is often performed after anodized processing because the porous anodized processing film has insufficient corrosion resistance. When performing the reactive process, the treatment may affect the deposition and etching's rate distribution due to the composition surface varying after treatment. We analyzed the sample's characteristics by SEM (Scanning Electron Microscope), XPS (X-Ray Photoelectron Spectroscopy) and TDS (Thermal Desorption Spectroscopy). Differing from the columnar structure, the boemite layer and the micropore inner surface composition are formed the same by sealing process. After performed the sealing process, gas emission multiplied by about 15 and the water of M/z=18 primarily increased.

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  In order to fabricate scanning probe tips, control of the electrochemical current is crucial to the radii of the head point. Equipment that monitors the current with a hysteresis switch, realized by means of a Schmitt trigger mechanism, enables the stable fabrication of high-quality tips. The details of the circuit design are described.

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