Journal of Surface Analysis
Online ISSN : 1347-8400
Print ISSN : 1341-1756
ISSN-L : 1341-1756
Volume 19, Issue 2
Displaying 1-4 of 4 articles from this issue
Paper
  • Takaya Fujita, Akiya Karen, Hiroshi Ito, Daisuke Fujita
    2012 Volume 19 Issue 2 Pages 76-80
    Published: 2012
    Released on J-STAGE: July 08, 2019
    JOURNAL FREE ACCESS
    Scanning capacitance microscopy (SCM) is one of techniques imaging two-dimensional carrier distribution in semiconductor devices. We have demonstrated that quantitative analysis of carrier concentration can be performed using calibration curves, which are statistically prepared for respective materials like silicon, silicon carbide, etc. The procedure was circulated to research organizations in domestic round robin test, and this method was found to be available from the viewpoint of comparability among users for the industrial standardization. It was also applied to other microscopes, and their profiles of carrier concentration coincide with each other, suggesting compatible to next-generation microscopes which would come up in the future.
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Technical Report
Serial Lecture
  • Ayahiko Ichimiya
    2012 Volume 19 Issue 2 Pages 85-93
    Published: 2012
    Released on J-STAGE: July 08, 2019
    JOURNAL FREE ACCESS
    Surface Debye temperatures for the Si(111)-(7×7) and the Si(111)-(√3×√3)-Ag surfaces are determined by the surface structural analysis of the reflection high-energy positron diffraction (RHEPD). Relations between surface phase transitions and root-mean-square amplitudes of surface atoms are discussed using the obtained surface Debye temperatures. An order-disorder phase transition of the Si(111)-(√3×√3)-Ag structure is discussed by the result of the structure analysis using order parameters of atomic arrangements of Ag. Difference of surface plasmon excitation processes between electron and positron beams is also discussed.
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Serial Review
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