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Volume 35, Issue 12
Displaying 1-10 of 10 articles from this issue
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Kohzo SUGIYAMA1984 Volume 35 Issue 12 Pages 538-546
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
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Keiichi KANEHORI, Kozo KAJITA, Katsuki MIYAUCHI, Tetsuichi KUDO1984 Volume 35 Issue 12 Pages 547-553
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
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Gotaro TANAKA, Kazunori MATSUI1984 Volume 35 Issue 12 Pages 554-561
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
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Yukinori KUWANO, Hisaki TARUI1984 Volume 35 Issue 12 Pages 562-571
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
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Yoshikatsu NAMBA1984 Volume 35 Issue 12 Pages 572-578
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
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Shuitsu MATSUO, Hideo NAGASHIMA1984 Volume 35 Issue 12 Pages 579-583
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
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Yasutaka TAKAHASHI, Satoshi WAKAYAMA, Akifumi OGISO, Kohzo SUGIYAMA1984 Volume 35 Issue 12 Pages 584-589
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
JOURNAL FREE ACCESSThe vapor deposition of TiO2 films by the decomposition of ethyl, isopropyl, n-butyl and t-butyl titanates was investigated. The deposits obtained at optimum conditions from the above complexes were identified respectively, as rutile, anatase, anatase containing a small quantity of rutile, and almost pure brookite. Thus any of the crystalline modifications of TiO2 can be obtained by selecting the appropriate complex and decomposition conditions. Tentative decomposition schemes are presented and discussed.View full abstractDownload PDF (772K) -
Hideaki ITOH, Masao GONDA, Kohzo SUGIYAMA1984 Volume 35 Issue 12 Pages 590-594
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
JOURNAL FREE ACCESSTitanium nitride and carbide films were coated onto the inner walls of carbon steel or stainless steel tubes by chemical vapor deposition. The optimum deposition temperature and the reaction time to obtain a TiN film of 10μm thick were 1050°C and 60min, respectively. The film thickness distribution along the axial direction of the tubes (inside diameter: 6-10mm) was highly dependent on the flow rate of the reactant gas (TiCl4+N2+H2). At a linear flow rate of 80cm/sec, a relatively uniform TiN film was deposited over a length of 8cm along the axial direction, even in which a maximum of the film thickness appeared at the inlet side of the tube. TiN and TiC films, which deposited on both steel substrates, showed fine-grained microstructures with some extent of preferred orientation. These films were adherent to the steel substrates, and no cracks or pin-holes were observed even after dipping corrosion tests in various strong acids.View full abstractDownload PDF (1469K) -
Yoshiyuki FUNAKI, Tadashi MATSUZAWA, Yen C. HUANG1984 Volume 35 Issue 12 Pages 595-599
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
JOURNAL FREE ACCESSTitanium compound films (TiC, TiN and TiCxNy) were prepared at about 823K in plasma produced by DC glow discharge, with titanium tetrachloride as the vapor source and hydrogen, nitrogen and, methane as reactant gases. The phase of each compound film was confirmed by X-ray diffraction, and each pattern showed a strongly preferred orientation of (200), the same as that of PVD films. Microhardness was 3000 for TiC, 1800 for TiN and 2000 for TiCxNy. Comparison of the spectral reflectance curves showed that TiN also had almost the same color as PVD film.View full abstractDownload PDF (633K) -
Takakazu SUZUKI, Hiroyuki UMEHARA1984 Volume 35 Issue 12 Pages 600-602
Published: December 01, 1984
Released on J-STAGE: October 30, 2009
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