AlN, TiN, ZrN, HfN and Si
3N
4 were synthesized by nitrogen plasma torch in a short time. The identification of products were carried out by Xray diffraction. Their physical properties as well as the behavior at high temperature of them were examined. Moreover, using optical means, their structures were examined.
AIN was most easily synthesized while Si
3N
4 was the most difficult.
In Si
3N
4 it was seen that the silicon melted at high temperature coagulated again to prevent nitrogen from diffusion into it.
Based upon X-ray diffraction patterns, these five nitrides were identified with hexagonal AlN, cubic TiN, cubic ZrN, face centered cubic HfN, and hexagonal Si
3N
4, respectively. A small quantity of β-Si
3N
4 mixed with α-type. Lattice constants calculated mostly agreed with values reported hitherto. To the contrary, density was more close to theoretical density than any other reported values.
A crystal growth of TiN was minutely observed under the optical microscope. It seemed that the crystal grew into dendritic pyramid starting from skeletal crystal.
AlN was oxidized rapidly at 1000°-1200°C changing into Al
2O
3 although over 700°C oxidation carried out gradually. By means of high temperature X-ray diffraction, two characteristic peaks of Al
2O
3 appeared at 1120°C and at 1200°C, respectively. In the lattice of AlN, diminishing of peaks of (100) and (110) planes were remarkable.
In comparision with powdered AlN, pressed AlN obviously more impeded the diffusion of air at 1000°C.
Wettability of AlN to fused glass was much smaller than that of any other nitrides.
As mentioned above, synthesized nitrides showed no great difference on their properties compared with hitherto reported products except that the synthesis period was shortened. Therefore when a small quantity of nitrides are urgently required, this procedure is considered to be of good use.
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