In the Part 1 (1) of this report, we discussed about the effects of voltage and concentration, and then, introduced the simple experimental formulae which showed the relations between the properties of anodic oxid film and these factors.
In succession to the preceding experiments, we examined the effects of time and concentration on oxid film in sulphuric acid process. In this experiments, the type of current is D. C. only and the other factors are held in constant, i. e., voltage is 15V and temperature of bath is 16-17°C. The inspection process for the properties of oxid film is the method soecified in. JIS P10431, 1951, which was used in preceding experiments.
The results of experiments are as follows.
(1) The relation between thickness of film and time and concentration is shown by following experimental formula.
(See Fig. 1, Fig. 2, Fig 3, Fig. 4, Table 1.)
1/T=1.52C
-1.326+0.0053+5.6-0.13C/t
[10<C<30 20<t<60]
T=Thickness (μ)
C=Concentration (%)
t=Time (min)
(2) The relation between thickness of film and electric power is shown by following farmula. (See Fig. 5, Fig. 6, Table 2.)
T=b
4+a
1W
T=Thickness (μ)
W=electric power (A/dm
2×V)
Coefficients, a
4 and b
4, vary with time as hown in Table 2.
(3) The relation between corrosion resistance and time and concentration is shown by fallowing experimental formula. (See Fig. 7, Fig. 8, Fig. 9, Table 3.)
1/S=7.56C-0.714-0.36/t
[10<C<30 20<t<60]
S=Corrosion Resistance (sec.)
C=Concentration (%)
t=Time (min)
(4) The relation between thickness of film and corrosion resistance is shown by the same experimental formula as that of the preceding report. (See Fig 10)
S=180T
0.253-239
T=Thickness (μ)
S=Corrosion Resistance (sec.)
(5) The relation between abrasion resistance and time is not able to be shown by the simple experimental formula although, the degreasing inclination is not so remarkable as film thickness or corrosion resistance, the increasing rate of abrasion resistance decreases gradually with time. (See Fig. 11)
(6) Specific abrasion resistance, abrasion resistance for each 1μ of film thickness, is improved greatly as time becomes long. (See Fig. 12)
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