Hyomen Kagaku
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
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Volume 34, Issue 10
Displaying 1-11 of 11 articles from this issue
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Preface
Special Issue: Plasma Processing of Nanomaterials
  • Present and Future of Research on Plasma Processing of Nanomaterials
    Masaharu SHIRATANI, Kazunori KOGA, Giichiro UCHIDA, Hyunwoong SEO, Nah ...
    Article type: Review
    2013 Volume 34 Issue 10 Pages 520-527
    Published: October 10, 2013
    Released on J-STAGE: October 20, 2013
    DOIhttps://doi.org/10.1380/jsssj.34.520
    JOURNAL FREE ACCESS
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    This paper reviews production of nanoparticles using low pressure reactive plasmas and its application to quantum dot sensitized solar cells. For the method, nanoparticles of several nm in size with a small size dispersion are produced in gas phase using reactive plasmas, and then the nanoparticles and radicals are co-deposited on a substrate. This method realizes one-step deposition of nanoparticle composite films in a controllable way.
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  • Plasma Etch Challenges for Nanoscale ULSI Device Fabrication: Modeling and Simulation of Surface Roughening and Rippling during Plasma Etching of Si
    Kouichi ONO, Hirotaka TSUDA, Nobuya NAKAZAKI, Yoshinori TAKAO, Koji ER ...
    Article type: Current Topic
    2013 Volume 34 Issue 10 Pages 528-534
    Published: October 10, 2013
    Released on J-STAGE: October 20, 2013
    DOIhttps://doi.org/10.1380/jsssj.34.528
    JOURNAL FREE ACCESS
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    Atomic- or nanometer-scale surface roughness has become an issue to be resolved in the fabrication of nanoscale ULSI devices, because the roughness at feature sidewalls and bottom surfaces is responsible for the variability in transistor performance. This paper presents a numerical and experimental study of surface roughening during plasma etching of Si in Cl2, with emphasis being placed on modeling, analysis, and control of plasma-surface interactions concerned. A three-dimensional atomic-scale cellular model (ASCeM-3D) based on Monte Carlo (MC) algorithm exhibited nanoscale surface roughening and rippling in response to ion incidence angle onto surfaces. Experiments were conducted to demonstrate the validity of our ASCeM-3D model, and to investigate how to suppress and/or control the formation of surface roughness and ripples during plasma etching, where a classical molecular dynamic (MD) simulation for Si/Cl and Si/SiCl systems was also invoked to further understand atomistic mechanisms concerned.
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  • Bio- and Medical-Application of Plasma-Functionalized Nanoparticles
    Masaaki NAGATSU, Enbo YANG, Han CHO, Akikazu SAKUDO, Kazuyoshi IKUTA
    Article type: Current Topic
    2013 Volume 34 Issue 10 Pages 535-540
    Published: October 10, 2013
    Released on J-STAGE: October 20, 2013
    DOIhttps://doi.org/10.1380/jsssj.34.535
    JOURNAL FREE ACCESS
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    In the present study, we have carried out the study to understand the interaction between the plasma and nanostructured materials. The main research subjects are to fabricate nano-sized particles by using dc arc discharge, to modify their surfaces of nanoparticles or nano-structured materials by using plasma chemical modification, and to immobilizethe biomolecules onto the surface of nanoparticles for bio- and medical application. Immobilization of the antibody of influenza virus onto the surface of aminated magnetic nanoparticles has been carried out for aiming at developing the feasibility of the selective detection of virus. The significant enhancement of condensation rate of influenza A type virus was confirmed by magnetic collection of antibody-immobilized magnetic nanoparticles. The result suggests a feasibility of the present method for selective influenza virus detection.
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  • Supercritical Fluid Plasma and Its Application to Nanomaterial Synthesis
    Kazuo TERASHIMA, Sven STAUSS
    Article type: Current Topic
    2013 Volume 34 Issue 10 Pages 541-546
    Published: October 10, 2013
    Released on J-STAGE: October 20, 2013
    DOIhttps://doi.org/10.1380/jsssj.34.541
    JOURNAL FREE ACCESS
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    In these days, plasmas generated in high-density medium, such as high-pressure gas and liquid, have received much attention to materials processing, especially nanomaterials synthesis. In this paper, the current states of the research of plasmas generated in supercritical fluids, namely supercritical fluid plasmas, such as its generation, characterization and application to the synthesis of nanomaterials are reviewed. Especially, we focus on preparation of various carbon nanomaterials, such as carbon nanotube and diamondoids (diamond molecules) by supercritical plasmas near the critical points, in which the density fluctuation caused by the supercritical condition close to critical points might promote the formation of such carbon nanostructured materials. This paper demonstrates the effectiveness of supercritical fluid plasma as high-performance materials processing, such as high-rate and low-temperature, and non-equilibrium processing.
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  • Plasmas in Contact with Liquid: “Plasma Electrochemistry”
    Tatsuru SHIRAFUJI, Nagahiro SAITO, Osamu TAKAI, Fumiyoshi TOCHIKUBO, K ...
    Article type: Current Topic
    2013 Volume 34 Issue 10 Pages 547-552
    Published: October 10, 2013
    Released on J-STAGE: October 20, 2013
    DOIhttps://doi.org/10.1380/jsssj.34.547
    JOURNAL FREE ACCESS
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    This paper describes historical overview and recent activity on “plasma electrochemistry”, which involves materials processing with plasmas in contact with liquids. Nano-materials synthesis and organic-pollutant decomposition are the most active application areas. The most important part of the plasma electrochemistry is the plasma/liquid interface. The physicochemical processes near the plasma/liquid interface have been gradually clarified through experiments and numerical simulations. These are briefly described in this paper together with future issues for understanding effects of electric double layer and nano-scale steep density gradient.
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Planning Series
Surface Science for Energy Issues
Science Café
Research Abroad
Qualifying Examination for Surface Science Engineers
News & Trends
Memorial
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