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Volume 43, Issue 4
Displaying 1-19 of 19 articles from this issue
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Kenzo YAMAMOTO1974 Volume 43 Issue 4 Pages 309
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Gunji SHINODA1974 Volume 43 Issue 4 Pages 310-323
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
JOURNAL FREE ACCESSMethod of composition determination of thin films and surface layers of solids using microbeams of X-rays, Auger electrons and secondary ions is reviewed and discussions are made about their limitations and accuracies. About X-ray method using electron microprobe a historical survey from the early stage of thickness determination to present Monte Carlo calcu-lation of Kyser and Murata has been done.
For Auger electron spectrometric method Palmberg view of quantitative analysis was introduced and some discussions has been made.
As to the quantitative procedures using secondary ions a practical methods Andersen based on thermodynamical considerations and results of Castaing and Slodzian based on physical process investigations were reviewed.View full abstractDownload PDF (1191K) -
Taisaku KOZUMA1974 Volume 43 Issue 4 Pages 324-329
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
JOURNAL FREE ACCESSSome properties of the stress-sensitive piezoresistive regions formed by the selective diffu-sion of p-type impurities into silicon have been theoretically and experimentally investigated.
Gage-factor of the diffused layer is dependent on surface impurity concentration but is independent of layer thickness.
The results were applied to a transducer with a single-crystal silicon diaphragm having pressure-sensitive piezoresistive regions.View full abstractDownload PDF (403K) -
Hiroshi YANAZAWA, Norikazu HASHIMOTO, Mikio ASHIKAWA1974 Volume 43 Issue 4 Pages 330-334
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
JOURNAL FREE ACCESSThe adverse effects of moisture on Si devices have been wellknown for a long time. It is important to investigate the adsorption properties of the insulators which passivate the Si devices. However the behavior of H2O in the insulator films has not been much studied for the lack of suitable measurement technique. This report is concerned with new thchniques to evaluate the trace amount of H2O in CVD oxide films by mass spectrometry and BET surface area by Kr adsorption method. Moreover, the adsorption characteristics of the CVD oxide films were investigated by the quantitative measurements of their porosity and H2O contents.View full abstractDownload PDF (442K) -
Keitaro YOSHIHARA, Minoru SUMITANI, Katsuo NISHI, Ichiro YOKOYAMA, Sab ...1974 Volume 43 Issue 4 Pages 335-340
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
JOURNAL FREE ACCESSThe nanosecond laser-photolysis system were studied with a repetitive nitrogen gas laser and with two different types of spectro-flashes. The first is the xenon flash with a few micr-osecond pulse duration. The laser trigger system consists of two successive spark-gap switches which are operated by a common trigger pulse to the xenon flash. The details of the actual construction of the coaxial-type nitrogen laser, gap switches, and trigger system are described. The second is the fluorescence of an organic dye solution excited by the nitrogen laser.
The laser pulse passes through the dye cell and also excites the adjacent sample solution.
The photo-physical properties of the pyrene solution were studied. The absorption spectra of the lowest excited singlet state to the higher excited states, of excimers, and of the lowest triplet state were observed. The time-resolved absorption spectra clearly show the photo-dynamic behaviors of these excited states. The characteristics of the present two methods are discussed.View full abstractDownload PDF (1273K) -
Shigeki HANAMURA1974 Volume 43 Issue 4 Pages 341
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Masaaki KUBOTA1974 Volume 43 Issue 4 Pages 342
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Masaaki KUBOTA1974 Volume 43 Issue 4 Pages 343
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Shigeki HANAMURA1974 Volume 43 Issue 4 Pages 344
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Katsumi TAKAMI, Norio KANEKO, Chiaki SHINPO1974 Volume 43 Issue 4 Pages 345-353
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Yuzuru KUSAKA1974 Volume 43 Issue 4 Pages 354-359
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Susumu KATO1974 Volume 43 Issue 4 Pages 360-364
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Yoshimasa KOBAYASHI1974 Volume 43 Issue 4 Pages 365-371
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Isao NIISHI1974 Volume 43 Issue 4 Pages 372-376
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Takaharu ONISHI1974 Volume 43 Issue 4 Pages 377-381
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Kenjiro SAKURAI, Satoshi ISHIHARA1974 Volume 43 Issue 4 Pages 382-384
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Yoshitada OSHIDA, Yasutsugu TAKEDA1974 Volume 43 Issue 4 Pages 385-387
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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Akio KOHNO1974 Volume 43 Issue 4 Pages 388-391
Published: April 10, 1974
Released on J-STAGE: February 09, 2009
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1974 Volume 43 Issue 4 Pages 409
Published: 1974
Released on J-STAGE: February 09, 2009
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