The surface treatment of glass substrates affects the
in situ polymerization of pyrrole on them. Here, we have studied the initial deposition process for the positively charged substrates. It was found that no notable difference is induced by dipping the substrates in solutions containing one or two components of the
in situ polymerization solution, prior to
in situ polymerization. However, dipping in the
in situ polymerization solution containing all three components, pyrrole, FeCl
3 and
p-toluenesolfonic acid sodium salt (PTSNa) removed the rest time. This fact implies that the polymerization reaction of pyrrole on the substrate is required to initiate the deposition of polypyrrole. It was also observed that photoelectron emission from the substrates for which the polymerization was quenched during the rest time, indicating the depositon of oligomerized or polymerized pyrrole on the substrates although the deposition could not be detected by the optical absorption spectra.
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