N
2 gas flow medium-vacuum arc plasma with titanium cathode is applied to the PVD process producing TiN films.
In this paper, plasma parameters of such arc are measured for the pressure range from 10
-3 to 10
-1 Torr using the optical emission spectroscopy and the probe technique. The experimental results show that the arc plasma contains Ti and N
2 as neutral particles, and Ti
+, Ti
++ and N
2+ as ions. The spectral intensities of Ti
+ and N
2 have maximum values at pressures of 2×10
-2 and 8×10
-3 Torr, respectively. As the pressure increases from 10
-3 to 10
-1 Torr, the electron energy decreases from 1.3 to 0.2eV and the electron density increases from 1.5×10
10 to 1.5×10
11cm
-3.
As a result of analyzing the above characteristics using the corona model, it becomes evident that the pressure at which the number densities of Ti
+ ion and N
2 molecule are maximum oincides with that at which TiN films are produced in the prevailing arc PVD apparatus.
抄録全体を表示