SiO
2 powder was allowed to react with Cd(OH)
2 for 1 week and 2 months respectively, after adjustment to various pH's by adding some aliquots of KOH to the 0.005 M of Cd(NO
3)
2 solution containing SiO
2 powder. Potentiometric titration curves for solutions with and without SiO
2 powder were obtained by plotting pH of each test solution after the reaction as a function of the amount of K OH added. X-Ray diffraction and scanning electron microscopy were also performed for the reaction products. Formation of Cd(OH)
2 and cadmium silicate occurred after 1 week and 2 months, respectively. Differe nce in the shape of potentiometric titration curves of the solutions with and without Si02 powder was f ound, which suggested that there was the difference between the state of Cd(OH)
2 precipitated in the bulk of solution and that deposited onto the surface of the SiO
2 powder after 1 week of reaction. The shape of the titration curve obtained after the reaction of 2 months reflects the formation of cadmium silicate. The formation of cadmium silicate was found to occur by the reaction of SiO
2 powder with Cd(OH)
2 in the pH region of near 8 where SiO
2 powder was hardly dissolved. It is concluded that cadmium silicate is formed by the reaction consisting of deposition of Cd(OH)
2 onto SiO
2 powder surface by adding KOH and subsequent interfacial reaction between the deposited Cd(OH)
2 and the substrate of SiO
2 powder, and not by the reaction of the dissolved silicic acid with cadmium ion in the solution.
View full abstract