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Fumio Kobayashi, Yukitoshi Otani, Toru Yoshizawa, Manabu Harada
Session ID: G38
Published: 2009
Released on J-STAGE: February 25, 2010
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Akihiro Masaya, Ryosuke Murakami, Motoharu Fujigaki, Yoshiharu Morimot ...
Session ID: G39
Published: 2009
Released on J-STAGE: February 25, 2010
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Whole-space tabulation method is a technique of producing phase-coordinate tables pixel-by-pixel which relates phases of the projected grating to the spatial coordinates. In this paper, it is confirmed that accurate real-time shape measurement can be performed using FPGA memory board.
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Yasuhiko Arai, Masaki Ando, Shunsuke Yokozeki
Session ID: G40
Published: 2009
Released on J-STAGE: February 25, 2010
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The three-dimensional measurement method by SEM has already been proposed by using the principle of shadow moiré. In this method, there are some troubles in order to perform a high-resolution analysis. A new method based on the principle of projection moiré is discussed to solve the troubles. In this paper, the mechanism of producing some shadows of the grid on the surface of the object by back scattering electron beam is discussed. Fringe image as the shadow of grating is analyzed by the Wavelet transform. 3-D precise measurement can be realized by using the phenomenon of shadows of grid by electron. The error analysis of the proposed method is also performed. Furthermore, a three dimensional structure of the head of a hard disk is measured by the system using the grating of which pitch is 4 m. From comparison with AFM, it is confirmed that the proposed method has high-resolution power.
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Shoji Noguchi, Takayoshi Kobayashi
Session ID: G61
Published: 2009
Released on J-STAGE: February 25, 2010
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Keitaro Oka, Hirokazu Shimoda
Session ID: G62
Published: 2009
Released on J-STAGE: February 25, 2010
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Sousuke Matsuuchi, Masashi Shindo, Hirokazu Shimoda
Session ID: G63
Published: 2009
Released on J-STAGE: February 25, 2010
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Masahiro Ueda, Hirokazu Shimoda
Session ID: G64
Published: 2009
Released on J-STAGE: February 25, 2010
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Osamu Nakamura, Shigeo Shimizu
Session ID: G66
Published: 2009
Released on J-STAGE: February 25, 2010
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Masaki Tomioka, Hirokazu Shimoda, Shigeo Shimizu
Session ID: G67
Published: 2009
Released on J-STAGE: February 25, 2010
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Hiroki Umezawa, Shigeo Shimizu, Kengo Iwafuchi, Yukio Satoh, Yoshikazu ...
Session ID: G68
Published: 2009
Released on J-STAGE: February 25, 2010
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Shunsuke Sakai, Taku Oba, Shigeo Shimizu
Session ID: G69
Published: 2009
Released on J-STAGE: February 25, 2010
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Jiang Zhu, Xiaoyi Wang, Yoshio Saito, Tomohisa Tanaka
Session ID: H01
Published: 2009
Released on J-STAGE: February 25, 2010
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The process of decomposing complex product into various levels of subassemblies is time-consuming and mistakable at assembly planning stage. Reorganizing directly structure tree in digital system is an efficient method for repartitioning rapidly subassemblies that satisfy various requirements of assembly manufacturing. In this paper, a new assembly model based Assembly Relationship Element (ARE) was firstly proposed, which could support reorganizing structure tree. Some methods of verifying reorganization process and evaluating reorganized result were presented to help user planning subassembly correctly and optimally.
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-Introducing Heterogeneity of Service Quality-
Nobutada Fujii, Toshiya Kaihara, Tomoya Yoshikawa
Session ID: H02
Published: 2009
Released on J-STAGE: February 25, 2010
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Shinichirou Harada, Eiji Morinaga, Akira Tsumaya, Hidefumi Wakamatsu, ...
Session ID: H03
Published: 2009
Released on J-STAGE: February 25, 2010
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Yuichi Aizawa, Takeshi Takenaka, Kanji Ueda, Hajime Asama
Session ID: H04
Published: 2009
Released on J-STAGE: February 25, 2010
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Construction of Verb/Noun Hierarchal Structure based on Formulation of Function Dividing Process
Shota Ohashi, Masaki Yamamoto, Eiko Yamamoto, Toshiharu Taura
Session ID: H06
Published: 2009
Released on J-STAGE: February 25, 2010
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In this study, to fully utilize the merits of natural language, we aim to propose a methodology for supporting conceptual design using a structured dictionary composed of hierarchal structure of verb/noun. In this report, we construct a conceptual design-specific thesaurus. In particular, we semi-automatically extract the hierarchical structure of verb/noun from an accumulated document related to design. Finally, we show the constructed thesaurus's usability.
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Investigation of Composition-based Function Dividing Process and Verb/Noun Hierarchal Structures
Masaki Yamamoto, Shota Ohashi, Eiko Yamamoto, Toshiharu Taura
Session ID: H07
Published: 2009
Released on J-STAGE: February 25, 2010
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In this study, to fully utilize the merits of natural language, we aim to propose a methodology for supporting conceptual design using a structured dictionary composed of hierarchal structures for verb/noun. In this report, we propose the composition-based function dividing process -the process of combining two different functions and dividing it. We introduce the procedure for creative engineering design into function dividing process and expand the method of conceptual design. Then, we investigate hierarchal structures for verb/noun in supporting the composition-based function dividing process.
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Customer Scenario Model for Service Life-Cycle Design
Koji Kimita, Yoshiki Shimomura
Session ID: H08
Published: 2009
Released on J-STAGE: February 25, 2010
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Importance Analysis of a Service Delivery Process based on Quality Function Deployment and Kano Model
Hiroshi Kato, Tatsunori Hara, Yoshiki Shimomura, Tamio Arai
Session ID: H09
Published: 2009
Released on J-STAGE: February 25, 2010
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A Service Design Method Regarding Customer Value and Corporate Requirements
Masayuki Yamagishi, Koji Kimita, Yoshiki Shimomura
Session ID: H13
Published: 2009
Released on J-STAGE: February 25, 2010
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Service Design Process Regarding Service Offering Organization Structure
Fumiya Akasaka, Koji Kimita, Yoshiki Shimomura, Tamio Arai
Session ID: H14
Published: 2009
Released on J-STAGE: February 25, 2010
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A method of extracting functions from service delivery process using function taxonomy
Masataka Nakajima, Hiroshi Kato, Yoshiki Shimomura, Tamio Arai
Session ID: H15
Published: 2009
Released on J-STAGE: February 25, 2010
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Use scenarios and present analysis of Service CAD System
Tatsunori Hara, Tamio Arai, Yoshiki Shimomura
Session ID: H16
Published: 2009
Released on J-STAGE: February 25, 2010
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Design of Service Delivery Process Considering Customer Characteristics
Yoshiki Taniguchi, Tatsunori Hara, Tamio Arai, Yoshiki Shimomura
Session ID: H18
Published: 2009
Released on J-STAGE: February 25, 2010
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Takeshi Tateyama, Yoshiki Shimomura, Seiichi Kawata, Tamio Arai
Session ID: H19
Published: 2009
Released on J-STAGE: February 25, 2010
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A method for supporting service design using web resource
Kazuhiro Oki, Ryosuke Chiba, Yoshiki Shimomura, Tamio Arai
Session ID: H20
Published: 2009
Released on J-STAGE: February 25, 2010
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Kunishige Wakamatsu, Akira Tsumaya, Eiji Morinaga, Kazuhiro Takeuchi, ...
Session ID: H21
Published: 2009
Released on J-STAGE: February 25, 2010
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Hideki Yachiku, Hidefumi Konishi, Takako Onishi, Akira Nakajima
Session ID: H22
Published: 2009
Released on J-STAGE: February 25, 2010
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Yoshiki Nakada, Kazuyoshi Tsuchiya, Yasutomo Uetsuji
Session ID: H31
Published: 2009
Released on J-STAGE: February 25, 2010
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Combinatorial search for Ni-Nb-Zr amorphous alloys
Junpei Sakurai, Seiichi Hata, Mitsuhiro Abe, Yuko Aono, Akira Shimokoh ...
Session ID: H32
Published: 2009
Released on J-STAGE: February 25, 2010
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Recently, the fabrication of functional aspherical optical glass lenses with diffraction gratings has been expected. Until now, we searched for Pt-based amorphous alloys as novel glass lens molding die materials using combinatorial method. Although Pt-based amorphous alloys showed good properties for glass lens molding die materials, they are very expensive. In this study, we report the properties of Ni-Nb-Zr thin film amorphous alloys for functional glass lens molding die materials.
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Takehiro Sato, Kazuyoshi Tsuchiya
Session ID: H33
Published: 2009
Released on J-STAGE: February 25, 2010
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Takayuki Suzuki, Masao Kohzaki
Session ID: H34
Published: 2009
Released on J-STAGE: February 25, 2010
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Masao Noma, Michiru Yamashita, Toshio Tokoro, Takumi Imada, Keiji Ogaw ...
Session ID: H35
Published: 2009
Released on J-STAGE: February 25, 2010
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Fuminori Imatake, Ryouichi Tsuta, Akifumi Yamauchi, Hiromu Iwata, Taka ...
Session ID: H37
Published: 2009
Released on J-STAGE: February 25, 2010
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Yohei Sawamura, Hiroaki Fujino, Yoshifumi Suzaki, Hiromu Iwata, Takash ...
Session ID: H38
Published: 2009
Released on J-STAGE: February 25, 2010
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Temperature history and metallographic structure on 0.45%C steel
Satoshi Kiuchi, Hiroyuki Sasahara
Session ID: H39
Published: 2009
Released on J-STAGE: February 25, 2010
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Unkai SATO, Toshikazu TAKENOUCHI, Takao YAMAZAKI
Session ID: H40
Published: 2009
Released on J-STAGE: February 25, 2010
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In this paper, it is described that it makes the basic characteristics of electrolytically oxidized water of dilute NaCl clear. First, the structure and the characteristic of the equipment which makes electrolyzed water were described. Next, as for the relation between the electrolytic-current and the characteristic of electrolytically oxidized water, it made clear experimentally. In the same way, it made the change of the characteristics of electrolyzed water by the elapse in the time clear. Also, it measured about the dissolution oxygen concentration in electrolytically oxidized water, too. Lastly, using the etching experimental results to the oxygen-free copper material, it proved the characteristics of electrolytically oxidized water.
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Unkai SATO, Toshikazu TAKENOUCHI, Takao YAMAZAKI
Session ID: H41
Published: 2009
Released on J-STAGE: February 25, 2010
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This paper describes the influence of electrolytically oxidized water dilute NaCl on the surface of pure nickel. First, we clarified the etching characteristic of electrolytically-oxidized water of dilute NaCl against the surface of pure nickel using HCl solution for comparative immersion experiments. The results show electrolytically-oxidized water works well for the etching operation, and if the ORP/pH value of the electrolytically-oxidized water is high, the etching speed becomes correspondingly fast. The etching rate of electrolytically-oxidized water is big (about 3 times) compared with the HCl solution of the same pH value. Next, by the observation of the SEM image and surface roughness, the influence of electrolytically oxidized water on the shape of the pure nickel surface became clear. The results indicated that like HCl solution, electrolytically oxidized water has the performance to rough a pure nickel material surface. The study indicates that electrolytically oxidized water can be applied to the surface treatment and washing of pure nickel.
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Yuko Inaki, Takahiro Namazu, Nozomu Araki, Keisuke Yoshiki, Shozo Inou ...
Session ID: H61
Published: 2009
Released on J-STAGE: February 25, 2010
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We have tried to deposit PTFE thin films onto (001) Si substrate by means of rf magnetron sputtering. PTFE disk (75mm in diameter) was used as a target material. Pure Ar (purity: 99.999%) was used as working gas, whose pressure was varied between 0.2 and 1.0 Pa. XPS and FT-IR measurements of as-deposited films showed that the films contain C-F bonds. The film composition was analyzed to be about C:F = 2:3 regardless of deposition conditions. We have also confirmed that our PTFE thin films show water repellency as well as bulk material.
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Hiroki Akiyama, Nobuyuki Zettsu, Kazuya Yamamura
Session ID: H62
Published: 2009
Released on J-STAGE: February 25, 2010
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Kei Nakamura, Yoshihito Yamaguchi, Hiromasa Ohmi, Hiroaki Kakiuchi, Ki ...
Session ID: H63
Published: 2009
Released on J-STAGE: February 25, 2010
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We have developed a low-temperature and high-rate film growth technology using 150-MHz very high-frequency plasma. By utilizing a cylindrical rotary electrode, silicon nitride (SiN
x) films were prepared from He/H
2/NH
3/SiH
4 mixtures on Si(001) wafers with very high rates (>100 nm/min) at substrate temperatures lower than 300°C. Optical emission spectroscopy was used to discuss the film-forming reactions both in the gas phase and on the growing film surface. As a result, by optimizing the NH
3/SiH
4 ratio and H
2 concentration, a good-quality SiN
x film showing a BHF (buffered hydrofluoric acid) etching rate as low as 12 nm/min was obtained.
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Study of the film growth process by flow and heat transfer analyses
Keita Tabuchi, Kentarou Ouchi, Hiromasa Ohmi, Hiroaki Kakiuchi, Kiyosh ...
Session ID: H64
Published: 2009
Released on J-STAGE: February 25, 2010
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We are developing a low-temperature and high-rate film formation technology using atmospheric-pressure very high-frequency (VHF) plasma. In our previous studies, we have investigated the relationship between the structural and electrical properties of microcrystalline Si (mc-Si) films and the deposition parameters, such as HH
2 and SiHH
4 flow rates, and VHF power densities. In this report, we discuss the growth process of mc-Si films in the atmospheric-pressure VHF plasma by using the PHOENICS software, which is a general-purpose three dimensional numerical simulator for flow and heat transfer.
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Effect of H radical incidence onto Si(001)2x1:H
Kouji Inagaki, Ryota Kanai, Kikuji Hirose, Kiyoshi Yasutake
Session ID: H65
Published: 2009
Released on J-STAGE: February 25, 2010
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Hiromasa Ohmi, Hiroaki Kakiuchi, Kiyoshi Yasutake
Session ID: H67
Published: 2009
Released on J-STAGE: February 25, 2010
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Hiromasa Ohmi, Hiroaki Kakiuchi, Kiyoshi Yasutake
Session ID: H68
Published: 2009
Released on J-STAGE: February 25, 2010
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This paper proposes the dry etching method for Si-related materials without both PFC gases and unstable and toxic gases. In the experiment, the etchant gases were generated locally by utilizing the chemical reaction between stable fluorocarbon resin and plasma. Then the Si dry etching was achieved at etching rate more than a few μm/min. This result suggests that the proposed dry etching method is useful technology from the viewpoint of eco-friendly manufacturing.
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Yoshifumi Suzaki
Session ID: H69
Published: 2009
Released on J-STAGE: February 25, 2010
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Akiou Kawaguchi, Yoshifumi Suzaki, Hayato Miyagawa, Takehiko Murase, T ...
Session ID: H71
Published: 2009
Released on J-STAGE: February 25, 2010
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Yoshikazu Yoshida
Session ID: I01
Published: 2009
Released on J-STAGE: February 25, 2010
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Influence of gap in the thin metal lap welding on thermal deformation
Noritaka Asano, Takeji Arai
Session ID: I02
Published: 2009
Released on J-STAGE: February 25, 2010
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When thin two plates join it, the gap and surface condition do important role by the decision of the welding performance. However, there are few papers which deal with thermal deformation quantitatively, up to now, by laser lap welding. In the present study, the influence that the gap in lap welding exerted on the welding performance and the influence of thin sheet metal on thermal deformation were clarified. Moreover, the comparisons test of the thin metal thickness of 2mm that assumed the state of the ideal with no gap between two metals was tried.
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Shin Haraguchi, Yasuhiro Okamoto, Yoshiyuki Uno, Tomokazu Sakagawa, Sh ...
Session ID: I03
Published: 2009
Released on J-STAGE: February 25, 2010
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