Biphenyl (BP) was irradiated under a xenon lamp in the presence of various concentrations of NO
X. Some nitrobiphenyl compounds (2-nitrobiphenyl, 4-nitrobiphenyl, 2, 2'-dinitrobiphenyl, 2, 4'-dinitrobiphenyl and 4, 4'-dinitrobiphenyl) were detected among the reaction products by gas chromatography. The organic compounds were tested for mutagenicity towards Salmonella typhimurium TA 98 by means of the plate-incorporation test, and 4, 4'-dinitrobiphenyl was the most potent mutagen among the products identified in the present study. However, the mutagenicity of the photochemical reaction mixture of biphenyl (1 mmol) with NO
X (6 mmol) was about eight times stronger than that of an artificial mixture of intact biphenyl and the identified nitrobiphenyls in the absence of the S-9 microsomal activation system. In summary, unidentified components of the photochemical reaction mixture of biphenyl with NO
X are the major direct mutagens ; the amount of these components increased with increasing amount of NO
X, and reached 54.8% of the total reaction mixture by weight (for 1 mmol BP with 6 mmol NO
X).
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