Quantum yields for decomposition of a series of i-line sensitive photoacid generators were evaluated in acetonitrile solution or in polystyrene films. Sulfonate ester derivatives of
N-hydroxynaphtaleneimide, fluorenone oxime, and thioxanthone oxime were investigated. Photolysis degree of photoacid generators was successfully estimated by UV or in situ FT-IR spectral changes. First-order decomposition profiles were observed for all photoacid generators on i-line irradiation. Quantum yields for decomposition (Φ
d) were calculated based on the rate of decomposition and molar absorption coefficient of photoacid generators. The Φ
d values were determined by using fluorenylideneimino
p-toluenesulfonate as a standard. The Φ
d values of photoacid generators derived from fluorenone oxime and thioxanthone oxime were similar to those of conventional photoacid generators. The relationship between thermal stability of photoacid generators and those Φ
d values was also discussed.
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